Oxygen in Tetrafluoromethane

The mixture gas of tetrafluoromethane and oxygen is widely used in silicon, silica, silicon, phosphorus silicon nitride thin film material such as glass and tungsten etching, in the production of electronic components surface cleaning, solar cells, laser technology, gas phase insulation, cryogenic refrigeration, leak inspection agent, attitude control space rockets, printed circuit also has a lot of use in the production of detergent, etc.