フルオロメタン

Fluoromethane (CH₃F), also known as HFC-41, methyl fluoride, or fluoromethane, is an organic compound with the chemical formula CH₃F. It is a colorless gas with a pungent odor, and is soluble in ether and ethanol.

Fluoromethane has an ozone depletion potential (ODP) of 0, a global warming potential (GWP) of 116, and an atmospheric lifetime of 2.8 years. It is characterized by good chemical stability, flammability, non-toxicity, and non-corrosiveness.

As a specialty gas, CH₃F is widely used in plastic materials, metal processing, pharmaceuticals, chemicals, electronics, and semiconductor industries.

Leveraging advanced technology, Jinhong Gas has mastered the large-scale production of CH₃F, ensuring a sustainable supply of high-quality products to the global market.

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プロセス

Electronic-grade CH3F, owing to its excellent properties, is widely used in the following fields:Semiconductor Etching Processes:Electronic-grade fluoromethane is an efficient etching gas, commonly applied in reactive ion etching (RIE) during semiconductor chip manufacturing.Gas Blending Applications:In practical production, fluoromethane is often mixed with gases such as oxygen, nitrogen, helium, argon, nitrogen trifluoride (NF3), and carbon dioxide to meet diverse process requirements.Flat Panel Display and Photovoltaics:In the manufacturing of flat panel displays (e.g., TFT-LCD, OLED) and photovoltaic cells, fluoromethane is also used in thin-film etching and cleaning processes, enabling fine device processing and performance optimization.Eco-friendly Refrigerant:As fluoromethane contains no chlorine atoms and causes no damage to the ozone layer, it is regarded as a potential environmentally friendly refrigerant alternative.Jinhong Gas can produce 5N-grade high-purity CH3F products through purification technology.
GASMonofluoromethane
CAS番号.593-59-3
純度≥99.999%

アプリケーション

半導体

High-purity CH3F is a green and efficient next-generation etching gas, applicable to the etching of semiconductors and electronic products, such as the selective etching of silicon compound thin films. In semiconductor and electronic manufacturing, HFC-41 dissolves fluorine ions under radio-frequency fields, enabling selective etching of silicon compound films through reactive ion etching (RIE).

Refrigeration

Due to the ozone-depleting effects of chlorofluorocarbons (CFCs) and hydrochlorofluorocarbons (HCFCs), CH3F—free of chlorine atoms and non-damaging to the ozone layer—is regarded as a potential environmentally friendly refrigerant alternative.

Chemistry

CH3F serves as a key fluorine-containing intermediate in organic synthesis. It can be introduced into more complex molecular structures and is used in the synthesis of various fluorinated compounds.

よくある質問

What product specifications can you provide?

Cylinder: 47L Valve: DISS724 Filling Capacity: 16Kg

How is Methyl Fluoride (CH₃F) produced?

There are two main synthesis methods for CH₃F: Gas-phase fluorination: Using chloromethane (CH₃Cl) and hydrogen fluoride (HF) as raw materials, a fluorination reaction occurs under the action of a catalyst.Gas-phase hydrogenolysis dechlorination: Using chlorofluoromethane (CH₂ClF) or dichlorofluoromethane (CHCl₂F) as raw materials, they react with hydrogen under the action of a catalyst to produce crude CH₃F. After a series of chemical purification and physical distillation processes, high-purity electronic grade CH₃F is obtained.

Is Methyl Fluoride a greenhouse gas?

Yes. CH₃F is considered a moderate greenhouse gas. It has an ozone depletion potential (ODP) of 0, a global warming potential (GWP) of 116, and an atmospheric lifetime of about 2.8 years.

What is the environmental impact of Methyl Fluoride?

If leakage occurs during production, use, or discharge, CH₃F may accumulate in the local environment. Due to its flammability, it poses a risk of fire or explosion. In the event of a large-scale leak, decomposition may generate by-products such as hydrogen fluoride, which can cause short-term contamination of soil, water, and ecosystems.

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