The largest use of carbon monoxide is in the chemical industry where it is used in the synthesis of a wide variety of chemicals such as esters, ketones, aldehydes and glycols as well as for the production of phosgene, a common chemical intermediate. Normally the demand for carbon monoxide at chemical production sites is so great that it is produced on-site, though occasionally supplies in tube trailers may be viable.
The chemical formula of chlorine is Cl2, which is a toxic gas. It is mainly used in high-tech fields such as large-scale integrated circuits, optical fibers, and high-temperature superconductivity. Chlorine is widely used in tap water disinfection, pulp and textile bleaching, ore refining, organic and inorganic chloride synthesis, etc. It is also used in the production of pesticides, bleaches, disinfectants, solvents, plastics, synthetic fibers and other chlorides.
The chemical formula of chlorine is Cl2, which is a toxic gas. It is mainly used in high-tech fields such as large-scale integrated circuits, optical fibers, and high-temperature superconductivity. Chlorine is widely used in tap water disinfection, pulp and textile bleaching, ore refining, organic and inorganic chloride synthesis, etc. It is also used in the production of pesticides, bleaches, disinfectants, solvents, plastics, synthetic fibers and other chlorides.
Electronic-grade dichlorosilane is a high-purity compound critically important in the semiconductor industry, especially for the production of silicon-based electronic devices. Commonly represented as SiH₂Cl₂, it is a colorless volatile liquid primarily used as a precursor for producing ultra-pure silicon in integrated circuits, photovoltaic cells, and other advanced electronic applications. This compound is carefully refined to remove impurities, ensuring strict control over its composition to meet the stringent requirements of electronic-grade materials. Its controlled use in chemical vapor deposition (CVD) processes enables the formation of high-precision, pure silicon layers, which are essential for the development of cutting-edge electronic components.
Disilane (chemical formula: Si₂H₆) is a non-corrosive toxic gas. It is pyrophoric in air, with an ignition point below room temperature. Upon exposure to air, it ignites instantly and decomposes into silane (SiH₄) and hydrogen (H₂). Under its own vapor pressure, disilane exists as a liquid. It can be mixed in any proportion with hydrogen, argon, nitrogen, and helium.
Its boiling point is -14.3 °C, melting point is -132.6 °C, and critical temperature is 150.85 °C. Disilane has a wide flammability range: at concentrations above 0.2%, it burns with a visible flame; at concentrations below 0.2%, it undergoes oxidation, producing white SiO₂.
Disilane exhibits chemical properties similar to silane, but with higher reactivity. It is less stable than silane, decomposing slowly into silane and hydrogen at room temperature. At 300–500 °C, it decomposes into SiH₄, SinHm, and H₂, and also decomposes under light exposure.
Disilane is mainly used in applications such as solar cells, photoconductive drums, amorphous silicon films, epitaxial growth, oxide films, nitride films, and chemical vapor deposition (CVD).
Fluoromethane (CH₃F), also known as HFC-41, methyl fluoride, or fluoromethane, is an organic compound with the chemical formula CH₃F. It is a colorless gas with a pungent odor, and is soluble in ether and ethanol.
Fluoromethane has an ozone depletion potential (ODP) of 0, a global warming potential (GWP) of 116, and an atmospheric lifetime of 2.8 years. It is characterized by good chemical stability, flammability, non-toxicity, and non-corrosiveness.
As a specialty gas, CH₃F is widely used in plastic materials, metal processing, pharmaceuticals, chemicals, electronics, and semiconductor industries.
Leveraging advanced technology, Jinhong Gas has mastered the large-scale production of CH₃F, ensuring a sustainable supply of high-quality products to the global market.
Hexachlorodisilane, also known as hexachlorodisilane or disilicon hexachloride, is a colorless liquid with high stability and low volatility. It reacts violently upon contact with water and is insoluble in alcohols and strong alkalis.
As a member of the chlorosilane family, HCDS represents one of the high-value oligomeric chlorosilanes. It serves as an important intermediate in organic synthesis and is widely utilized for the preparation of disilanes and related compounds.
Beyond its role in chemical synthesis, HCDS is increasingly applied in thin film manufacturing, semiconductor processes, and the solar energy industry, making it a critical material in advanced electronic and energy applications.
Hexafluoro-1,3-butadiene (C₄F₆) is a critical gas that defines the performance of etching processes in advanced semiconductor manufacturing. Its purity level directly determines the yield and device performance of cutting-edge chip fabrication. Leveraging continuous process innovation, Jinhong Gas has achieved simultaneous breakthroughs in both purity and mass production capacity of C₄F₆, establishing itself as an indispensable high-purity gas supplier for supporting advanced semiconductor processes.
Hexafluoroethane is a colorless, inflammable gas that is insoluble in water but soluble in ethanol. Its boiling point is -78.2°C, the melting point is -100.6°C, and its critical temperature is 19.7°C. Hexafluoroethane is generally used for plasma etching gas in the microelectronics industry, as well as device surface cleaning, optical fiber production, and low temperature refrigeration.
Hydrogen bromide is an inorganic compound with a chemical formula of HBr and a molecular weight of 80.91. It is a colorless gas with standard conditions and is the basic raw material for chemical synthesis.
Hydrogen bromide is an inorganic compound with a chemical formula of HBr and a molecular weight of 80.91. It is a colorless gas with standard conditions and is the basic raw material for chemical synthesis.
Hydrogen bromide is an inorganic compound with a chemical formula of HBr and a molecular weight of 80.91. It is a colorless gas with standard conditions and is the basic raw material for chemical synthesis.
Hydrogen chloride is a transparent colorless or slightly yellow strong corrosive liquid with a pungent odor. A concentrated hydrochloric acid contains 38% HCl, the relative density is 1.19, the melting point is -112°C, and the boiling point is -83.7°C. Hydrogen chloride is an important inorganic chemical raw material, widely used in dyes, medicine, food, printing and dyeing, leather, metallurgy and other industries.
Methane is a colorless, odorless, flammable gas. The relative density is 0.5547, the boiling point is -164°C, and the melting point is -182.48°C. Methane is an important fuel and an important chemical raw material. Natural gas with methane as the main component is a high-quality gas fuel with a long history. It has been exploited and utilized on a large scale and has become the third energy source in the world.
Methane is a colorless, odorless, flammable gas. The relative density is 0.5547, the boiling point is -164°C, and the melting point is -182.48°C. Methane is an important fuel and an important chemical raw material. Natural gas with methane as the main component is a high-quality gas fuel with a long history. It has been exploited and utilized on a large scale and has become the third energy source in the world.
Nitric oxide, with the chemical formula NO and a molecular weight of 30.01, is a compound. Its chemical properties are very active, and when it reacts with oxygen, it can form a corrosive gas – nitrogen dioxide.
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