Dichlorosilane

Electronic-grade dichlorosilane is a high-purity compound critically important in the semiconductor industry, especially for the production of silicon-based electronic devices. Commonly represented as SiH₂Cl₂, it is a colorless volatile liquid primarily used as a precursor for producing ultra-pure silicon in integrated circuits, photovoltaic cells, and other advanced electronic applications. This compound is carefully refined to remove impurities, ensuring strict control over its composition to meet the stringent requirements of electronic-grade materials. Its controlled use in chemical vapor deposition (CVD) processes enables the formation of high-precision, pure silicon layers, which are essential for the development of cutting-edge electronic components.

Process

Dichlorosilane is primarily synthesized via the silicon–hydrogen–chloride method, using industrial-grade silicon and hydrogen chloride gas as raw materials, and reacting them directly under specific catalysts and controlled temperatures. It can also be obtained through the disproportionation of trichlorosilane or via silane chlorination methods. Currently, Jinhong purifies externally sourced low-content dichlorosilane through distillation, achieving an annual production of 6N dichlorosilane of up to 200 tons.
Liquid Gas Electronic-grade dichlorosilane
CASNo. 4109-96-0
Purity ≥99.995%
O2+Ar <1 ppm
N2 <1 ppm
CO <1 ppm
CO2 <1 ppm
HCL <30 ppm
Monochlorosilane/MCS <10 ppm
Silicon tetrachloride/STC <1 ppm
Trichlorosilane/TCS <1 ppm
Methane/CH4 <1 ppm
Non-methane hydrocarbons/NMHC <1 ppm
Dichlorosilane/SiH2Cl2 (calculated as metal ion) ≥99.9999%
 

Applications

Semiconductor Industry

Chemical Vapor Deposition (CVD): Serves as a silicon source for depositing polycrystalline silicon films, epitaxial silicon layers, and dielectric layers such as silicon dioxide (SiO₂) and silicon nitride (Si₃N₄) in chip fabrication. It is one of the key materials in front-end semiconductor processes. Solar Photovoltaics: Used in the production of polycrystalline silicon solar cells as a precursor for depositing high-purity silicon.

Synthetic Intermediates

Acts as an important precursor for synthesizing other organosilicon compounds and high-purity silane (SiH₄).

Frequently Asked Question

What product specifications do you offer?

Cylinder: DOT 47L Valve: DISS 636 Fill Weight: 40 kg

How should dichlorosilane be safely stored and handled?

Storage: Store in a cool, dry, and well-ventilated non-combustible warehouse, away from heat sources and open flames. Handling: Operators must be professionally trained and wear full personal protective equipment, including chemical safety goggles, gas masks, corrosion-resistant gloves, and protective clothing. Fire Extinguishing Media: Use dry sand, dry powder, or carbon dioxide extinguishers. Do not use water.

What are the advantages of dichlorosilane in the semiconductor industry?

Dichlorosilane is widely used in high-end applications due to its unique chemical properties: Moderate Reactivity: More controllable than silane, allowing operation within optimized process windows, especially temperature. High Deposition Rate: Improves production efficiency and reduces manufacturing costs. Excellent Film Quality: Deposited silicon-based films exhibit low defect density, high uniformity, and good step coverage. Chlorine Feature: Chlorine atoms help etch weakly bonded silicon atoms during deposition, enabling selective deposition (growth only in specific regions) and improving film crystallinity.

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