Electronic-grade dichlorosilane is a high-purity compound critically important in the semiconductor industry, especially for the production of silicon-based electronic devices. Commonly represented as SiH₂Cl₂, it is a colorless volatile liquid primarily used as a precursor for producing ultra-pure silicon in integrated circuits, photovoltaic cells, and other advanced electronic applications. This compound is carefully refined to remove impurities, ensuring strict control over its composition to meet the stringent requirements of electronic-grade materials. Its controlled use in chemical vapor deposition (CVD) processes enables the formation of high-precision, pure silicon layers, which are essential for the development of cutting-edge electronic components.
| Liquid Gas | Electronic-grade dichlorosilane |
| CASNo. | 4109-96-0 |
| Purity | ≥99.995% |
| O2+Ar | <1 ppm |
| N2 | <1 ppm |
| CO | <1 ppm |
| CO2 | <1 ppm |
| HCL | <30 ppm |
| Monochlorosilane/MCS | <10 ppm |
| Silicon tetrachloride/STC | <1 ppm |
| Trichlorosilane/TCS | <1 ppm |
| Methane/CH4 | <1 ppm |
| Non-methane hydrocarbons/NMHC | <1 ppm |
| Dichlorosilane/SiH2Cl2 (calculated as metal ion) | ≥99.9999% |
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