Trifluoroiodomethane

Thanks to its excellent properties, CF3I is widely applied in the following areas: -Fire Suppression: Efficiently extinguishes fires by interrupting combustion chains through iodine radicals. Suitable for aircraft, data centers, and other environments with high equipment protection requirements, serving as a replacement for Halon 1301. -Semiconductor Etching: Under plasma excitation, CF3I releases fluorine and iodine radicals, providing highly selective etching for materials such as silicon and silicon dioxide. It is ideal for advanced processes like 3D NAND Flash, enabling low-damage, high aspect-ratio microfabrication. -Refrigerant: Non-flammable, with good oil solubility and material compatibility, CF3I can replace conventional CFCs in air conditioning, refrigeration, and similar systems. -Pharmaceuticals & Chemical Intermediates: Used to introduce the trifluoromethyl group, enhancing the stability, bioactivity, or performance of drugs and materials, e.g., in the synthesis of medications for depression or arthritis. -Insulating & Arc-Extinguishing Gas: Offers insulation strength higher than SF6; decomposition produces no toxic byproducts, making it suitable for electrical equipment applications. The synthesis of CF3I primarily involves the thermolysis of trifluoroacetates, gas-phase catalytic synthesis, and halogen atom exchange methods. At Jinhong Gas, the gas-phase catalytic method is used: trifluoromethane (CHF3) reacts with elemental iodine (I2) at high temperature (550°C) under catalytic conditions to produce trifluoroiodomethane, which is then purified via distillation to obtain 4N-grade CF3I gas.

GAS	Trifluoroiodomethane
CAS No.	2314-97-8
Purity of CF3I	≥ 99.99%
O2/Ar	≤ 30 ppm
N2	≤ 20 ppm
H2O	≤ 30 ppm
CO2	≤ 10 ppm
CF3H	≤ 5 ppm
HF	≤ 5 ppm
Total impurity content	≤ 100 ppm