Carbon Dioxide in Argon
Mixture gas of CO2/Ar is a compressed gas, does not support combustion, cylinder containers are easy to overpressure when heated, and there is danger of explosion. It is used as a welding gas.
Menu
Mixture gas of CO2/Ar is a compressed gas, does not support combustion, cylinder containers are easy to overpressure when heated, and there is danger of explosion. It is used as a welding gas.
Electronic-grade dichlorosilane is a high-purity compound critically important in the semiconductor industry, especially for the production of silicon-based electronic devices. Commonly represented as SiH₂Cl₂, it is a colorless volatile liquid primarily used as a precursor for producing ultra-pure silicon in integrated circuits, photovoltaic cells, and other advanced electronic applications. This compound is carefully refined to remove impurities, ensuring strict control over its composition to meet the stringent requirements of electronic-grade materials. Its controlled use in chemical vapor deposition (CVD) processes enables the formation of high-precision, pure silicon layers, which are essential for the development of cutting-edge electronic components.
Helium is inert and the least soluble of all gases in liquids and is therefore used as a pressurization. Being inert, helium is used as a constituent in neutral atmospheres e.g., in heat treatment applications requiring a protective atmosphere.
Helium is used extensively in the welding industry as an inert shielding gas for arc welding. It is also used in conjunction with helium (“leak”) detectors to test the integrity of fabricated components and systems.
Hexafluoro-1,3-butadiene (C₄F₆) is a critical gas that defines the performance of etching processes in advanced semiconductor manufacturing. Its purity level directly determines the yield and device performance of cutting-edge chip fabrication. Leveraging continuous process innovation, Jinhong Gas has achieved simultaneous breakthroughs in both purity and mass production capacity of C₄F₆, establishing itself as an indispensable high-purity gas supplier for supporting advanced semiconductor processes.
The chemical formula of nitrogen trifluoride is NF₃. It is a colorless, odorless and stable gas at normal temperature. It is a strong oxidant. High purity nitrogen trifluoride has excellent etch rate and selectivity, and it is also a very good cleaning agent. Jinhong can provide you with high-purity nitrogen trifluoride gas to improve your semiconductor process.
Silanes are compounds of silicon and hydrogen, including monosilane (SiH4), disilane (Si2H6), and some higher-order silicon-hydrogen compounds. Among them, monosilane is the most common, and monosilane is sometimes abbreviated as silane. Silane is a colorless, air-reactive and suffocating gas.
The chemical formula of xenon is kr, which is a natural noble gas with the largest relative atomic mass and the highest density. The main application of xenon is in the lighting industry, but also used in the medical and semiconductor industries.
This website uses cookies to improve your browsing experience. By continuing to use this website, you agree to our use of cookies.