Hexafluorobutadiene

In semiconductor manufacturing, hexafluorobutadiene (C4F6) is a critical etching gas widely applied in the following scenarios: Precision dry etching of materials such as silicon and silicon nitride in the production of advanced logic chips and high-end memory devices (e.g., 3D NAND). With its high selectivity and excellent profile control, it is particularly suitable for fine-pattern etching processes at 65 nm technology nodes and below. The industrial synthesis of hexafluorobutadiene (C4F6) primarily adopts a catalytic fluorination process, in which hydrogen fluoride reacts with specific halogenated butenes or butynes. It can also be produced via reduction or fluorine-exchange pathways from hexafluorobutadiene derivatives. At Jinhong Gas, multi-stage purification and precision rectification technologies are employed to deeply refine crude products. The core lies in the effective removal of trace isomers, reactive impurities, and metal ions, ensuring the product meets electronic-grade purity requirements. Currently, Jinhong Gas has achieved an annual production capacity of 200 tons of high-purity (≥99.99%) hexafluorobutadiene.

GAS	Hexafluorobutadiene
CAS No.	685-63-2
Purity of C4F6	≥99.99%
O2+Ar	＜1 ppm
N2	＜5 ppm
CO2	＜2 ppm
Other fluorocarbons	＜100 ppm
Isopropyl alcohol(C3H8O)	< 2 ppm
Water	＜5 ppm
Acidity (in HF)	＜2 ppm
Total impurities	＜100 ppm