Other gases

Carbon Monoxide

The largest use of carbon monoxide is in the chemical industry where it is used in the synthesis of a wide variety of chemicals such as esters, ketones, aldehydes and glycols as well as for the production of phosgene, a common chemical intermediate. Normally the demand for carbon monoxide at chemical production sites is so great that it is produced on-site, though occasionally supplies in tube trailers may be viable.

Chlorine

The chemical formula of chlorine is Cl2, which is a toxic gas. It is mainly used in high-tech fields such as large-scale integrated circuits, optical fibers, and high-temperature superconductivity. Chlorine is widely used in tap water disinfection, pulp and textile bleaching, ore refining, organic and inorganic chloride synthesis, etc. It is also used in the production of pesticides, bleaches, disinfectants, solvents, plastics, synthetic fibers and other chlorides.

Chlorine (5N)

The chemical formula of chlorine is Cl2, which is a toxic gas. It is mainly used in high-tech fields such as large-scale integrated circuits, optical fibers, and high-temperature superconductivity. Chlorine is widely used in tap water disinfection, pulp and textile bleaching, ore refining, organic and inorganic chloride synthesis, etc. It is also used in the production of pesticides, bleaches, disinfectants, solvents, plastics, synthetic fibers and other chlorides.

Hexafluoroethane

Hexafluoroethane is a colorless, inflammable gas that is insoluble in water but soluble in ethanol. Its boiling point is -78.2°C, the melting point is -100.6°C, and its critical temperature is 19.7°C. Hexafluoroethane is generally used for plasma etching gas in the microelectronics industry, as well as device surface cleaning, optical fiber production, and low temperature refrigeration.

Hydrogen Bromide

Hydrogen bromide is an inorganic compound with a chemical formula of HBr and a molecular weight of 80.91. It is a colorless gas with standard conditions and is the basic raw material for chemical synthesis.

Hydrogen Bromide (5N)

Hydrogen bromide is an inorganic compound with a chemical formula of HBr and a molecular weight of 80.91. It is a colorless gas with standard conditions and is the basic raw material for chemical synthesis.

Hydrogen Bromide (5N5)

Hydrogen bromide is an inorganic compound with a chemical formula of HBr and a molecular weight of 80.91. It is a colorless gas with standard conditions and is the basic raw material for chemical synthesis.

Hydrogen Chloride

Hydrogen chloride is a transparent colorless or slightly yellow strong corrosive liquid with a pungent odor. A concentrated hydrochloric acid contains 38% HCl, the relative density is 1.19, the melting point is -112°C, and the boiling point is -83.7°C. Hydrogen chloride is an important inorganic chemical raw material, widely used in dyes, medicine, food, printing and dyeing, leather, metallurgy and other industries.

Methane

Methane is a colorless, odorless, flammable gas. The relative density is 0.5547, the boiling point is -164°C, and the melting point is -182.48°C. Methane is an important fuel and an important chemical raw material. Natural gas with methane as the main component is a high-quality gas fuel with a long history. It has been exploited and utilized on a large scale and has become the third energy source in the world.

Methane (5N)

Methane is a colorless, odorless, flammable gas. The relative density is 0.5547, the boiling point is -164°C, and the melting point is -182.48°C. Methane is an important fuel and an important chemical raw material. Natural gas with methane as the main component is a high-quality gas fuel with a long history. It has been exploited and utilized on a large scale and has become the third energy source in the world.

Nitric Oxide

Nitric oxide, with the chemical formula NO and a molecular weight of 30.01, is a compound. Its chemical properties are very active, and when it reacts with oxygen, it can form a corrosive gas – nitrogen dioxide.

Nitrogen Trifluoride

The chemical formula of nitrogen trifluoride is NF₃. It is a colorless, odorless and stable gas at normal temperature. It is a strong oxidant. High purity nitrogen trifluoride has excellent etch rate and selectivity, and it is also a very good cleaning agent. Jinhong can provide you with high-purity nitrogen trifluoride gas to improve your semiconductor process.

Nitrogen Trifluoride (5N)

The chemical formula of nitrogen trifluoride is NF₃. It is a colorless, odorless and stable gas at normal temperature. It is a strong oxidant. High purity nitrogen trifluoride has excellent etch rate and selectivity, and it is also a very good cleaning agent. Jinhong can provide you with high-purity nitrogen trifluoride gas to improve your semiconductor process.

PSA Nitrogen Generator

PSA nitrogen generator is a nitrogen generation device based on Pressure Swing Adsorption (PSA) technology. It is primarily used to separate high-purity nitrogen from air and finds widespread applications in industries, laboratories, and medical fields. PSA Nitrogen Machine Technology is a very mature technology and has been around since the 1970’s. In fact, thousands of PSA plants are serving customers worldwide.

Sulphur Dioxide

Sulfur dioxide is a colorless gas at room temperature with a pungent odor. It has strong permeability, can penetrate into various gaps quickly, and is easily absorbed by items, especially wet items. Sulfur dioxide is toxic to humans, and the maximum allowable concentration in the air is 15mg/m3.

Tetrafluoromethane

Carbon tetrafluoride is a colorless, odorless and tasteless gas. His is a melting point of -150°C (-184°C), a boiling point of 128°C and a density of 1.96g/cm3.

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