Hexafluoroethane

Hexafluoroethane is a colorless, inflammable gas that is insoluble in water but soluble in ethanol. Its boiling point is -78.2°C, the melting point is -100.6°C, and its critical temperature is 19.7°C. Hexafluoroethane is generally used for plasma etching gas in the microelectronics industry, as well as device surface cleaning, optical fiber production, and low temperature refrigeration.

Process

Hexafluoroethane may be obtained as a by-product of CFC production, or by direct fluorination of ethane.
Gas Hexafluoroethane
CAS No. 76-16-4
Purity 99.999%

Applications

Semiconductors

Hexafluoroethane is used for dry etching of silicon dioxide and for stripping photoresist.

Semiconductors

Hexafluoroethane is used as a refrigerant in certain low temperature applications and as a component in some refrigerant blends.

Frequently Asked Question

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Cylinder: 44L Valve: CGA660, DISS716 Content:40kg

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