HF

Hydrofluoric Acid

Hydrofluoric acid (HF) is a colorless liquid or gas known for its extreme corrosiveness. Composed of fluorine and hydrogen, it is soluble in water, releasing a significant amount of heat upon dissolution to form hydrofluoric acid aqueous solutions. Hydrofluoric acid is unique in its ability to corrode glass and metals and can react with many organic and inorganic substances.

Industrially, hydrofluoric acid is extensively used in petroleum refining, pharmaceutical production, the synthesis of high-purity inorganic substances and organic fluorocompounds, and glass etching. Its reactivity with silicon makes it indispensable in semiconductor manufacturing and glass cleaning processes.

Process

Hydrofluoric acid can be formed by the direct reaction of hydrogen and fluorine gases under specific conditions, or by reacting calcium fluoride (CaF2) with concentrated sulfuric acid (H2SO4) upon heating. In the latter method, the reaction produces hydrofluoric acid gas and calcium sulfate precipitate, and the hydrofluoric acid gas can then be dissolved in water to form an aqueous solution of hydrofluoric acid.

Gas	Hydrofluoric acid (HF)
CAS	7664-39-3
Purity	≥99.99%

Applications

Semiconductor

Used for cleaning silicon wafers and etching silicon to form microcircuit patterns in semiconductor manufacturing industry

Glass etching

Employed to etch glass, creating decorative items and glass components for precision instruments.

Chemical synthesis

Acts as a reagent in the preparation of organic and inorganic fluorocompounds.

Petroleum refining

Utilized to remove non-fluorinated impurities during the refining process.

Metal surface treatment

Used to remove oxide layers and other impurities from metal surfaces.

Frequently Asked Question

What is the purity level of your hydrofluoric acid?

We offer a variety of purities of hydrofluoric acid to choose from: industrial grade hydrofluoric acid 40-70%, electronic grade purity 40-55%. Industrial anhydrous hydrogen fluoride 99.99%, high-purity hydrogen fluoride 99.999%.

Can your hydrofluoric acid be used in semiconductor manufacturing?

Absolutely, our high-purity hydrofluoric acid is ideal for semiconductor manufacturing processes, including silicon wafer cleaning and etching, thanks to its minimal impurities.

Is your hydrofluoric acid suitable for glass etching applications?

Yes, the high purity of our hydrofluoric acid makes it perfect for precise and detailed glass etching applications, producing clear and consistent results.

What sizes and packaging options are available for your hydrofluoric acid?

We offer a variety of packaging options, including tanker trucks, steel cylinders, and ton drums, to meet different needs, from small-scale laboratory requirements to large industrial applications. For more details, please contact our sales team.

Inquiry

TEOS

Tetraethyl Orthosilicate

TEOS is obtained by esterification of silicon tetrachloride and ethanol at…

SF₆

Sulfur Hexafluoride

Sulphur hexafluoride is manufactured by direct fluorination of pure (elemental) Sulphur…

CO₂

Carbon Dioxide

Carbon dioxide is recovered from many different sources. It is obtained as an…

SiH₄

Silane

Silane is produced by the reduction of silicon tetrachloride by metal hydrides…

O₂

Oxygen

Oxygen is obtained on a commercial scale by the liquefaction and subsequent distillation of

Ar

Argon

The most common source of argon is an air separation plant. Air contains approx…

C₄F₈

Octafluorocyclobutane

Octafluorocyclobutane can be produced by the dimerization of tetrafluoroethylene through pyrolysis…

C₂H₂

Acetylene

Acetylene is manufactured commercially by reaction between calcium carbide…

NH₃

Ammonia

Ammonia is manufactured by the Haber-Bosch process, consisting of a direct reaction…

C₂H₄O

Ethylene Oxide(EO)

1.Chlorohydrination: First pass ethylene and chlorine gas into water to generate 2-chloroethanol…

N₂

Nitrogen

Nitrogen is produced in large quantities at air separation plants which liquefy and subsequently distil air into nitrogen…

N₂O

Nitrous Oxide

Nitrous oxide is obtained most commonly by the thermal decomposition of ammonium nitrate. It may also be obtained by…