Carbon Monoxide Application in Chemical Vapor Deposition (CVD) Processes
Abstract: Chemical Vapor Deposition (CVD), abbreviated as CVD, is a commonly used technique for thin film fabrication, playing a significant role in the field of materials science and engineering. In the CVD process, carbon monoxide (CO) serves as an important precursor molecule and finds wide applications in thin film growth and material synthesis. This article will focus on the primary role of carbon monoxide in the growth process of metal thin films during CVD. Carbon monoxide (CO) possesses high volatility and decomposability, allowing it to rapidly enter the reaction system and undergo decomposition reactions under appropriate temperature conditions, generating free carbon and oxygen atoms. This characteristic makes carbon monoxide an important choice