News & Blog

New Breakthrough in Jin Hong Gas’s Large-Scale On-Site Gas Production Project

On March 21, 2024, Jin Hong Gas signed a long-term supply contract for industrial gases with Yingkou Jianfa Shenghai Nonferrous Chemical Co., Ltd. Through the construction of a new air separation unit with a capacity of 66,000 Nm³/h, the company will supply industrial gases—oxygen and nitrogen—via pipeline to the customer. The total value of the contract is approximately 2.4 billion yuan (excluding tax). Industrial gases are fundamental raw materials for modern industries, extensively used in fields such as steel/non-ferrous metallurgy, petrochemicals, welding and metal processing, aerospace, and automotive and transportation equipment. For users who consume large quantities of industrial gases, Jin Hong Gas leverages its technical features and support service capabilities, relying

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Application and prospect of supercritical CO2 extraction

1. Application of Supercritical CO2 in Environmental Engineering 1.1 Regeneration of Activated Carbon Adsorbents Activated carbon possesses strong adsorption capabilities and can be reused, making it widely applied in various fields such as medicine, food, environment, and new materials. It plays a significant role in environmental engineering by adsorbing the majority of toxic and environmentally unfriendly gases. However, the use of activated carbon also poses challenges. After reaching saturation with adsorbed impurities, activated carbon needs regeneration. Currently, there are several difficulties in the regeneration process. For instance, incomplete removal of impurities during regeneration can affect the adsorption capacity of activated carbon. Moreover, regeneration often requires large amounts of high-temperature inert gas

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Common Cylinder Industrial Gas: FAQs and Troubleshooting Guide

Industrial gases play a crucial role in production and manufacturing processes. For instance, nitrogen is used for inert atmosphere protection, hydrogen for hydrogenation reactions, and oxygen for oxidation processes. However, when using these industrial gases, you may encounter some common issues and faults. This article will address some of the common industrial gas problems and provide troubleshooting advice to help readers better handle these issues. It is essential to note that different gases may have different characteristics, and specific solutions should be provided by professionals. This article only offers general information on potential issues with bottled gases. 1.Gas Leak: Reasons and Solutions Possible reasons: Faulty Valve Seal: A damaged or aged valve seal can

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Application and Challenges of High-Purity Argon Gas in Argon Arc Welding

Ⅰ.Introduction High-purity argon gas is a commonly used shielding gas in argon arc welding. Its high purity and inert characteristics make it an ideal choice for protecting the welding zone and ensuring high-quality welds. This article will explore the application of high-purity argon gas in welding, starting from the properties of argon gas. We will also discuss a range of issues that may arise in practical applications. Argon (Ar) is a chemical element and belongs to the group of inert gases. It has an atomic number of 18 and a chemical symbol of Ar, placing it in the 18th group of the periodic table. Positioned between oxygen and nitrogen, argon is an inert

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Carbon Monoxide Application in Chemical Vapor Deposition (CVD) Processes

Abstract: Chemical Vapor Deposition (CVD), abbreviated as CVD, is a commonly used technique for thin film fabrication, playing a significant role in the field of materials science and engineering. In the CVD process, carbon monoxide (CO) serves as an important precursor molecule and finds wide applications in thin film growth and material synthesis. This article will focus on the primary role of carbon monoxide in the growth process of metal thin films during CVD. Carbon monoxide (CO) possesses high volatility and decomposability, allowing it to rapidly enter the reaction system and undergo decomposition reactions under appropriate temperature conditions, generating free carbon and oxygen atoms. This characteristic makes carbon monoxide an important choice

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Applications of Silane in Semiconductor Lithography Processes

Silane is a crucial chemical compound with wide-ranging applications in the semiconductor industry, particularly in lithography processes. Lithography is a key step in chip and integrated circuit manufacturing, where a photosensitive layer, known as photoresist, is used to define patterns and structures on the chip. Silane gas plays a vital role in improving the adhesion between the photoresist and the wafer surface, ensuring precise pattern transfer and enabling high-precision chip fabrication. Silane’s ability to enhance adhesion facilitates accurate pattern definition and replication during the lithography process, ultimately contributing to the production of high-quality semiconductor devices. During the lithography process, photoresist is coated onto the surface of a silicon wafer to

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